日本領導性技術公司獲得 Veeco 的全新離子束蝕刻系統
2017 年 11 月 13 日
Lancer IBE System to Enable Next Generation MEMS and Magnetic Sensor Production
Plainview, N.Y. - Veeco Instruments Inc. (Nasdaq: VECO) announced today it has received an order for its new Lancer™ Ion Beam Etch (IBE) System from a leading Japanese technology company. The system, which is scheduled to ship later this year, will enable the development of microelectromechanical systems (MEMS), magnetic sensors and advanced memory storage.
Veeco currently has over 300 installed ion beam etch systems worldwide supporting the data storage, MEMS and other magnetic thin film device applications. The new Lancer system was designed for the development and production of next generation electronic devices found in smartphones, self-driving automobiles and other ‘internet-of-things’ devices that enable connectivity, functionality and mobility.
“The Lancer IBE system is built on an exceptionally productive and proven platform that has been enabling smaller and more efficient technology for decades,” said Adrian Devasahayam, Ph.D., Vice President & General Manager, Veeco Advanced Deposition and Etch. “We have seen terrific results from customer demonstrations and believe this first order from a technology leader is validation of the Lancer’s versatile etching capabilities.”
Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch & clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets. To learn more about Veeco’s innovative equipment and services, visit www.veeco.com.
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